Thulium Laser Enhanced EUV Efficiency
This is a news story, published by Tom's Hardware, that relates primarily to EUV news.
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EUV lithography communityTom's Hardware
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Technology
American lab is developing a BAT laser that could enable 'beyond EUV' lithography
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The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more efficient than the CO2 lasers used in EUV tools.
This advancement could pave the way for a new generation of 'beyond EUV ' lithography systems that produce chips quicker and with less power.
Implementing BAT technologies into semiconductor production will require significant infrastructure changes.