welcome
Tom's Hardware

Tom's Hardware

Technology

Technology

American lab is developing a BAT laser that could enable 'beyond EUV' lithography

Tom's Hardware
Summary
Nutrition label

86% Informative

The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more efficient than the CO2 lasers used in EUV tools.

This advancement could pave the way for a new generation of 'beyond EUV ' lithography systems that produce chips quicker and with less power.

Implementing BAT technologies into semiconductor production will require significant infrastructure changes.